发明名称 MANUFACTURING APPARATUS FOR SEMICONDUCTOR DEVICE AND FOR LIQUID CRYSTAL DISPLAY DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To provide a manufacturing apparatus for a semiconductor device and a manufacturing method for a liquid crystal display device, which can suppress crackings due to heat strain of substrate and improve the throughput. SOLUTION: As for the manufacturing method for the semiconductor device which forms a semiconductor element on the substrate by an RTA method, preheating processes 304, 305, and 306 for heating the substrate 1 in stepwise manner are performed before the substrate 1 is heat-treated by the RTA method.</p>
申请公布号 JP2002305159(A) 申请公布日期 2002.10.18
申请号 JP20020029421 申请日期 2002.02.06
申请人 SANYO ELECTRIC CO LTD 发明人 MORIMOTO YOSHIHIRO
分类号 G02F1/1368;H01L21/265;H01L21/336;H01L29/786;(IPC1-7):H01L21/265;G02F1/136 主分类号 G02F1/1368
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