| 摘要 |
PROBLEM TO BE SOLVED: To provide an after-crosslinking composition for polishing which has excellent scratch resistance, stainproofness, and luster and is easily peelable and exhibits its properties shortly after coating. SOLUTION: The after-crosslinking composition for polishing comprises silica plate particles having an average particle diameter of <=50μm and an aspect ratio of 10-300, preferably a lamellar polysilicic acid comprising a scaly silica composed of silica X or silica Y, especially secondary particles having a laminated structure formed by laying a plurality of scaly primary particles having been oriented in parallel with one another between their planes one upon the other.
|
