| 摘要 |
PROBLEM TO BE SOLVED: To provide an electron beam exposure apparatus which stores a very small amount of exposure data and processes an extremely small amount of data. SOLUTION: This electron beam exposure apparatus is equipped with individual exposure data storage parts, which store shot position data indicating shot positions, as positions of a shot pattern that an electron beam should be exposed in divided partial exposure areas smaller than the width of possible reflection of the electron beam by a reflection part; an irradiation position calculating part which reads the shot position data, included in partial exposure areas, to be irradiated with the electron beam out of the individual exposure data storage part, and computes irradiation position data showing positions to be irradiated with the electron beam according to relative position between a stage position as the position of a wafer stage and the position of the partially exposure region and relative positions between the positions of the partially exposure region and the shot position; and a deflection control unit which controls the reflection part according to the irradiation position data.
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