发明名称 METHOD FOR MANUFACTURING THIN FILM TRANSISTOR FOR FLAT PANEL DISPLAY
摘要 PURPOSE: A method for manufacturing a thin film transistor for a flat panel display is provided to prevent hillock and a pin hole from being generated in a gate and prevent crack from being generated in an insulating film formed on the gate. CONSTITUTION: A method for manufacturing a thin film transistor for a flat panel display includes the steps of forming semiconductor layers(432,632) on a board(710) having a predetermined area; forming a first insulating film(740) on the semiconductor layers; forming a first gate(755) made of aluminum alloy system on the first insulating film and thereafter forming a second gate(765) made of molybdenum alloy system on the first gate to form a gate; forming a second insulating film on the gate; forming a contact hole on the second insulating film to disclose the semiconductor layers, forming patterned source and drain electrodes on the second insulating film to fill the contact hole.
申请公布号 KR20020078116(A) 申请公布日期 2002.10.18
申请号 KR20010018005 申请日期 2001.04.04
申请人 SAMSUNG SDI CO., LTD. 发明人 KOO, JAE BON;SHIN, HYEON EOK
分类号 G02F1/136;(IPC1-7):G02F1/136 主分类号 G02F1/136
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