发明名称 |
METHOD FOR MANUFACTURING THIN FILM TRANSISTOR FOR FLAT PANEL DISPLAY |
摘要 |
PURPOSE: A method for manufacturing a thin film transistor for a flat panel display is provided to prevent hillock and a pin hole from being generated in a gate and prevent crack from being generated in an insulating film formed on the gate. CONSTITUTION: A method for manufacturing a thin film transistor for a flat panel display includes the steps of forming semiconductor layers(432,632) on a board(710) having a predetermined area; forming a first insulating film(740) on the semiconductor layers; forming a first gate(755) made of aluminum alloy system on the first insulating film and thereafter forming a second gate(765) made of molybdenum alloy system on the first gate to form a gate; forming a second insulating film on the gate; forming a contact hole on the second insulating film to disclose the semiconductor layers, forming patterned source and drain electrodes on the second insulating film to fill the contact hole.
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申请公布号 |
KR20020078116(A) |
申请公布日期 |
2002.10.18 |
申请号 |
KR20010018005 |
申请日期 |
2001.04.04 |
申请人 |
SAMSUNG SDI CO., LTD. |
发明人 |
KOO, JAE BON;SHIN, HYEON EOK |
分类号 |
G02F1/136;(IPC1-7):G02F1/136 |
主分类号 |
G02F1/136 |
代理机构 |
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地址 |
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