| 摘要 |
PROBLEM TO BE SOLVED: To provide a positive type resist composition having improved edge roughness of a pattern and an improved trailing shape on an inorganic substrate and giving an excellent resist pattern profile. SOLUTION: The positive type resist composition contains a resin having an alicyclic hydrocarbon group and having a velocity of dissolution in an alkali developing solution increased by the action of an acid, a compound which generates the acid when irradiated with active light or radiation and at least one acetal compound represented by a specified structure. |
