摘要 |
<p>PROBLEM TO BE SOLVED: To provide an active matrix substrate which is formed by using a resin substrate and wherein the thermal degradation of the resin substrate can be prevented. SOLUTION: The active matrix substrate 10 consists of the resin substrate 1, a silicon dioxide film 2 as an insulation film formed on the resin substrate 1, a diode element 11 formed on the silicon dioxide film 2, a chromium film 7 as a metal wiring film formed in contact with the diode element 11 at the both ends of the diode element 11, an interlayer insulation film 8 formed to cover the chromium film 7, the diode element 11 and the silicon dioxide film 2 and an indium tin oxide(ITO) film 9 as a pixel electrode filling a contact hole 8a formed in the interlayer insulation film 8 so as to reach the chromium film 7 and formed on the interlayer insulation film 8.</p> |