发明名称 METHOD AND APPARATUS FOR PRODUCING SEMICONDUCTOR
摘要 <p>PROBLEM TO BE SOLVED: To provide a method and an apparatus for producing semiconductor, with which the yield of a semiconductor can be improved by detecting the destruction of insulation on the dielectric film of an electrostatic chuck. SOLUTION: An electrostatic chuck device is provided with means 104A, 104B, 105A and 105B for measuring a voltage V to be impressed to electrodes 102A and 102B and a current I to flow on the dielectric film, when attaching an object 101 to be treated. Also, control means 109A and 109B decide a case that a resistance value R found by the voltage V and the current I or the absolute value of the current I is greater than a reference resistance value R0 or the absolute value of a current value I0 or greater than the resistance value R or current value I found the last time, and issues a warning.</p>
申请公布号 JP2002305237(A) 申请公布日期 2002.10.18
申请号 JP20010106806 申请日期 2001.04.05
申请人 HITACHI LTD 发明人 MISE NOBUYUKI;HIRASAWA SHIGEKI;OKUDAIRA SADAYUKI;OMORI KAZUTOSHI;TAMARU TAKESHI
分类号 H01L21/302;H01L21/205;H01L21/3065;H01L21/68;H01L21/683;(IPC1-7):H01L21/68;H01L21/306 主分类号 H01L21/302
代理机构 代理人
主权项
地址