发明名称 |
METHOD OF MANUFACTURING DISPLAY DEVICE |
摘要 |
<p>PROBLEM TO BE SOLVED: To form plural patterns largely varying in processing accuracy without degrading productivity in forming a display device having a high function on a substrate of a super-large size. SOLUTION: The method of manufacturing the display device by forming a laminate of material layers of the prescribed patterns by a photolithography technique using a resist film on the surface of the substrate comprises forming the latent image of the resist film by combining both of a simultaneous exposure process using light and a direct drawing exposure process using an energy beam.</p> |
申请公布号 |
JP2002303989(A) |
申请公布日期 |
2002.10.18 |
申请号 |
JP20010107172 |
申请日期 |
2001.04.05 |
申请人 |
HITACHI LTD |
发明人 |
KAWACHI GENSHIRO |
分类号 |
G02F1/1368;G03F7/20;G09F9/00;H01L21/336;H01L29/786;(IPC1-7):G03F7/20;G02F1/136 |
主分类号 |
G02F1/1368 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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