发明名称 METHOD OF MANUFACTURING DISPLAY DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To form plural patterns largely varying in processing accuracy without degrading productivity in forming a display device having a high function on a substrate of a super-large size. SOLUTION: The method of manufacturing the display device by forming a laminate of material layers of the prescribed patterns by a photolithography technique using a resist film on the surface of the substrate comprises forming the latent image of the resist film by combining both of a simultaneous exposure process using light and a direct drawing exposure process using an energy beam.</p>
申请公布号 JP2002303989(A) 申请公布日期 2002.10.18
申请号 JP20010107172 申请日期 2001.04.05
申请人 HITACHI LTD 发明人 KAWACHI GENSHIRO
分类号 G02F1/1368;G03F7/20;G09F9/00;H01L21/336;H01L29/786;(IPC1-7):G03F7/20;G02F1/136 主分类号 G02F1/1368
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