| 摘要 |
PURPOSE: An exposure apparatus of a semiconductor device is provided to prevent a wafer from being contaminated by a contact with a vacuum chuck by performing an exposure process while the wafer is separated from the vacuum chuck, and to prevent a defocus phenomenon and an exposure defect by preventing a focus from being twisted by contaminants of the vacuum chuck. CONSTITUTION: The first chuck(23) absorbs and fixes the wafer on a wafer stage(21) of a disc type. The second chuck(22) fixes the wafer so that the periphery of the wafer is supported while the lower surface of the wafer does not contact the surface of the first chuck, formed in the edge of the wafer stage. A plurality of transfer pins(24) vertically transfer to load/unload the wafer to/from the second chuck.
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