| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an aligner and a method for exposure where the sufficient rigidity of a mask holder is ensured and a mask pattern is transferred precisely, even if a grazing-incidence measuring means is used to measure the height of a mask. SOLUTION: The face of a mask 1, facing opposite the pattern face thereof, is held in contact with a face of the mask holder 2 on the side of a projection optical system 8; in addition, the mounting face for a mask faces toward the projection optical system; and therefore, the distance from the projection optical system is easy to measure, and the accuracy of the mask mounting face is measured and corrected easily.</p> |
