SYSTEM AND METHOD FOR FILM DEPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a film deposition system by which an organic-compound film having a plurality of functional areas is deposited. SOLUTION: A plurality of evaporation sources (203a to 203c) are provided to the inside of a film deposition chamber 210, by which functional regions composed of the respective organic compounds in the evaporation sources can be continuously formed and further a mixed region can be formed in the interface between the functional regions. By using the film deposition system having such a film deposition chamber, impurity contamination between the functional areas can be prevented and the organic film in which an energy gap in the interface is relaxed can be deposited.