| 摘要 |
PROBLEM TO BE SOLVED: To make the processing of a substrate uniform. SOLUTION: A rotary housing 2 is provided rotatably in a housing 1, and a rotary driving device 3 which rotates the rotary housing 2 is provided; and a platform 4 is provided at the upper part of the rotary housing 2, and a substrate 5 is supported on the platform 4. In a processing state, the heating temperature of a lamp heating device 11 is held at, for example 1,000 deg.C and in a conveyance stage, the substrate is conveyed, while the lamp heating device 11 is placed in operation. |
