发明名称 POLYMER RESIN SUITABLE TO ION BEAM OR ION PLASMA OR ION IMPLANTATION FOR SHIELDING OF HAZARDOUS ELECTROMAGNETIC WAVE AND IMPARTING CONDUCTIVITY
摘要 PURPOSE: Provided is a high molecular resin composition which has high heat resistance temperature suitable to ion beam or ion implantation and durability, and which is excellent in dimensional stability. CONSTITUTION: The resin composition consists of one or more resin selected from the group consisting of polyphenylene oxide, polycarbonate, polybutylene terephthalate, polysulfone, polyethylene terephthalate, polyether sulfone, polyphenylene sulfide, polystyrene, acrylobutadiene styrene resin, polyetherimide, polyamide, polymethylmethacrylate, acetal resin, polyethylene, polypropylene, styrene butadiene rubber, ethylene propylene rubber, and EPDM rubber. The resin composition further comprises 0.01-50 wt% of glass fiber.
申请公布号 KR20020077988(A) 申请公布日期 2002.10.18
申请号 KR20010017751 申请日期 2001.04.03
申请人 GE PLASTICS KOREA 发明人 KIM, GWANG SEOP
分类号 C08J7/00;C08K3/00;C08K7/04;C08L67/02;C08L69/00;C08L71/00;C08L71/12;C08L81/06;C08L101/00;H01L23/00;H05K9/00;(IPC1-7):C08L69/00 主分类号 C08J7/00
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