发明名称 Method for determining the distance between periodic structures on an integrated circuit or a photomask
摘要 Fourier transformations are used to calculate a power spectrum of an image of an integrated circuit. The distance between periodic structures is determined from the first refraction maximum, which represents the reciprocal of the distance between the periodic structures. This enables performance of a simple method for calculating the distances between the periodic structures on integrated circuits or photomasks.
申请公布号 US2002149783(A1) 申请公布日期 2002.10.17
申请号 US20010034930 申请日期 2001.11.21
申请人 ROTSCH CHRISTIAN 发明人 ROTSCH CHRISTIAN
分类号 G01N21/956;G03F1/00;G03F7/20;(IPC1-7):G01B11/14 主分类号 G01N21/956
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