发明名称 Plasma reaction apparatus and plasma reaction method
摘要 A plasma reaction apparatus or a plasma reaction method have a configuration in which high-potential and low-potential electrodes are placed in a reactor and in which an inorganic dielectric having a structure permitting a gas to flow therethrough is filled between the electrodes, and is adapted to generate a discharge between the electrodes to change a gas existing between the electrodes into a plasma. The plasma reaction apparatus and method are configured to control the temperature inside the reactor and thereby process the gas on the basis of a stable plasma reaction.
申请公布号 US2002148562(A1) 申请公布日期 2002.10.17
申请号 US20020112750 申请日期 2002.04.02
申请人 AOYAGI HIROMI;NISHIGUCHI TOSHIJI;TAMURA JUNICHI 发明人 AOYAGI HIROMI;NISHIGUCHI TOSHIJI;TAMURA JUNICHI
分类号 H05H1/24;B01J19/08;C07B61/00;H01J37/32;(IPC1-7):C23C16/00;C23F1/00 主分类号 H05H1/24
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