发明名称 |
Plasma reaction apparatus and plasma reaction method |
摘要 |
A plasma reaction apparatus or a plasma reaction method have a configuration in which high-potential and low-potential electrodes are placed in a reactor and in which an inorganic dielectric having a structure permitting a gas to flow therethrough is filled between the electrodes, and is adapted to generate a discharge between the electrodes to change a gas existing between the electrodes into a plasma. The plasma reaction apparatus and method are configured to control the temperature inside the reactor and thereby process the gas on the basis of a stable plasma reaction.
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申请公布号 |
US2002148562(A1) |
申请公布日期 |
2002.10.17 |
申请号 |
US20020112750 |
申请日期 |
2002.04.02 |
申请人 |
AOYAGI HIROMI;NISHIGUCHI TOSHIJI;TAMURA JUNICHI |
发明人 |
AOYAGI HIROMI;NISHIGUCHI TOSHIJI;TAMURA JUNICHI |
分类号 |
H05H1/24;B01J19/08;C07B61/00;H01J37/32;(IPC1-7):C23C16/00;C23F1/00 |
主分类号 |
H05H1/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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