发明名称 |
Photomask and integrated circuit manufactured by automatically correcting design rule violations in a mask layout file |
摘要 |
A photomask and method for eliminating design rule violations from the photomask are disclosed. A photomask includes a substrate and a patterned layer formed on at least a portion of the substrate. The patterned layer may be formed using a mask pattern file created by comparing a feature dimension in a mask layout file with a design rule in a technology file, identifying a design rule violation if the feature dimension is less than the design rule and automatically correcting the identified design rule violation in the mask layout file.
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申请公布号 |
US2002152453(A1) |
申请公布日期 |
2002.10.17 |
申请号 |
US20020161527 |
申请日期 |
2002.06.03 |
申请人 |
DUPONT PHOTOMASKS, INC. A DELAWARE CORPORATION |
发明人 |
RITTMAN DAN |
分类号 |
G06F17/50;(IPC1-7):G06F17/50 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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