发明名称 |
Trägerplatte mit einer Substrateserkennungseinrichtung für eine chemisch-mechanische Poliervorrichtung |
摘要 |
<p>A carrier head (100) for a chemical mechanical polishing system includes a substrate sensing mechanism. The carrier head includes a base and a flexible member (118) connected to the base to define a chamber (200). A lower surface of the flexible member (118) provides a substrate receiving surface (274). The substrate sensing mechanism includes a sensor to measure a pressure in the chamber (200) and generate an output signal representative thereof, and a processor configured to indicate whether the substrate is attached to the substrate receiving surface (274) in response to the output signal.</p> |
申请公布号 |
DE69807780(D1) |
申请公布日期 |
2002.10.17 |
申请号 |
DE1998607780 |
申请日期 |
1998.05.22 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
BORIS, GOUZMAN;SOMEKH, SASSON;ZUNIGA, STEVEN;CHEN, HUNG |
分类号 |
B24B37/005;B24B37/30;H01L21/304;(IPC1-7):B24B37/04 |
主分类号 |
B24B37/005 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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