发明名称 Catadioptric lens used as a projection lens in semiconductor lithography comprises a beam divider partially surrounded by a holder, a mirror, lenses, a plate and an absorption unit arranged between the beam divider and the holder
摘要 Catadioptric lens comprises a beam divider (4) partially surrounded by a holder (12); a mirror (8); lenses (1-3); an lambda /4 plate (7); and an absorption unit (13) arranged between the beam divider and the holder on the side on which the stray light leaves the beam divider. The absorption unit absorbs the stray light. Preferred Features: The absorption unit is a glass substrate and is arranged on the side opposite the light bundle entering the beam divider and the holder. The glass substrate has an antireflection coating.
申请公布号 DE10118048(A1) 申请公布日期 2002.10.17
申请号 DE20011018048 申请日期 2001.04.11
申请人 CARL ZEISS 发明人 GERHARD, MICHAEL;PAUL, HANS-JOCHEN
分类号 G02B5/30;G02B1/11;G02B13/24;G02B17/08;G03F7/20;H01L21/027;(IPC1-7):G02B17/08 主分类号 G02B5/30
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