发明名称 |
Rectangle/lattice data conversion method for charged particle beam exposure mask pattern and charged particle beam exposure method |
摘要 |
The method involves determining a reference forward scattering intensity on the basis of a forward scattering intensity distribution of a pattern having a minimum design width included in the block pattern. Each pattern width in the block pattern is adjusted such that a width of a forward scattering intensity distribution at the reference forward scattering intensity becomes equal to a corresponding design width. The corrected exposure dose is determined such that a value obtained by multiplying a sum of the reference forward scattering intensity and a backscattering intensity by the corrected exposure dose become equal to each other. Independent claims are also included for the following: a rectangle-to-lattice data conversion method. |
申请公布号 |
EP1249734(A2) |
申请公布日期 |
2002.10.16 |
申请号 |
EP20020252579 |
申请日期 |
2002.04.10 |
申请人 |
FUJITSU LIMITED |
发明人 |
OGINO, KOZO;OSAWA, MORIMI |
分类号 |
H01J37/302;G03F7/20 |
主分类号 |
H01J37/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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