发明名称 Rectangle/lattice data conversion method for charged particle beam exposure mask pattern and charged particle beam exposure method
摘要 The method involves determining a reference forward scattering intensity on the basis of a forward scattering intensity distribution of a pattern having a minimum design width included in the block pattern. Each pattern width in the block pattern is adjusted such that a width of a forward scattering intensity distribution at the reference forward scattering intensity becomes equal to a corresponding design width. The corrected exposure dose is determined such that a value obtained by multiplying a sum of the reference forward scattering intensity and a backscattering intensity by the corrected exposure dose become equal to each other. Independent claims are also included for the following: a rectangle-to-lattice data conversion method.
申请公布号 EP1249734(A2) 申请公布日期 2002.10.16
申请号 EP20020252579 申请日期 2002.04.10
申请人 FUJITSU LIMITED 发明人 OGINO, KOZO;OSAWA, MORIMI
分类号 H01J37/302;G03F7/20 主分类号 H01J37/302
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