发明名称 Method and system for reticle inspection by photolithography simulation
摘要 A system and method are presented for optical inspection of reticles by simulating the operation of a selected stepper. The system utilizes a flying spot inspection technique and includes a scanning apparatus and a detection unit. The scanning apparatus uses a laser source similar to that of the stepper of interest. First and second light directing assemblies are accommodated in the optical paths of, respectively, incident and transmitted light, and are designed so as to provide coherence of the light substantially equal to that of the stepper.
申请公布号 US6466315(B1) 申请公布日期 2002.10.15
申请号 US19990390503 申请日期 1999.09.03
申请人 APPLIED MATERIALS, INC. 发明人 KARPOL AVNER;KENAN BOAZ
分类号 G01N21/956;G03F1/08;G03F7/20;(IPC1-7):C01N21/88 主分类号 G01N21/956
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