发明名称 Microelectronic capacitor structure compatible with copper containing microelectronic conductor layer processing
摘要 A method for fabricating a capacitor, and a capacitor fabricated employing the method. To practice the method, there is first provided a substrate. In accord with a first embodiment, there is then formed over the substrate a first capacitor electrode plate formed of a first copper containing conductor material. There is then formed upon the first capacitor electrode plate a first barrier layer. There is then formed upon the first barrier layer a capacitor dielectric layer. There is then formed upon the capacitor dielectric layer a second barrier layer. Finally, there is then formed upon the second barrier layer a second capacitor electrode plate formed of a second copper containing conductor material. The method contemplates a capacitor fabricated employing the method. In accord with a second embodiment, a capacitor dielectric material from which is formed the capacitor dielectric layer is not derived from a barrier material from which is formed the first barrier layer. The capacitors provide enhanced thermal interdiffusion stability and enhanced oxidation stability.
申请公布号 US6466427(B1) 申请公布日期 2002.10.15
申请号 US20000584807 申请日期 2000.05.31
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 CHEN SHENG-HSIUNG
分类号 H01L21/02;H01L21/334;(IPC1-7):H01G4/228;H01L27/108 主分类号 H01L21/02
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