发明名称 Semiconductor memory and method for fabricating the same
摘要 Semiconductor memory and method for fabricating the same, the semiconductor memory including a cell transistor having a trench region formed in a semiconductor substrate and channel regions at sides of the trench region, source/drain regions formed in a bottom of the trench region and in a surface of the substrate adjacent to the trench region and in contact with the channel region, and gate electrodes at sides of the trench insulated from the trench wall.
申请公布号 US6465299(B1) 申请公布日期 2002.10.15
申请号 US20000629099 申请日期 2000.07.31
申请人 HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. 发明人 SON WON SO
分类号 H01L27/10;H01L21/8242;H01L27/108;(IPC1-7):H01L21/824 主分类号 H01L27/10
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