发明名称 |
Apparatus for the simultaneous deposition by physical vapor deposition and chemical vapor deposition and method therefor |
摘要 |
Apparatus and method for the vacuum deposition of at least two different layers of thin film material onto a substrate by two different vacuum deposition processes. Also disclosed is a novel linear applicator for using microwave enhanced CVD to uniformly deposit a thin film of material over an elongated substrate.
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申请公布号 |
US6463874(B1) |
申请公布日期 |
2002.10.15 |
申请号 |
US20000637945 |
申请日期 |
2000.08.11 |
申请人 |
ENERGY CONVERSION DEVICES, INC. |
发明人 |
DOTTER, II BUDDIE R.;DOEHLER JOACHIM;ELLISON TIMOTHY;IZU MASATSUGO;OVSHINSKY HERBERT C. |
分类号 |
C23C14/34;C23C14/56;C23C16/02;C23C16/50;C23C16/511;C23C16/54;H01J37/32;(IPC1-7):C23C16/00;H05H1/00 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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