| 摘要 |
An ozone processing apparatus for a semiconductor processing system includes an ozone generating unit and a reforming processing unit connected to each other through a connection piping section. The ozone generating unit includes an ozone generator and a pressure regulator connected to each other through a piping line. The connection piping section has a double-pipe structure consisting of an inner pipe and an outer pipe. The piping line and the inner pipe are made of a fluorocarbon resin. A branch line branches from the middle of the piping line, and is connected to a factory exhaust passageway. The branch line is provided with a flowmeter and an ozone densitometer. A controller is arranged to control the ozone generator with reference to the value of ozone concentration measured by the densitometer.
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