发明名称 Thin film wiring board and method for manufacturing the same, base substrate and method for manufacturing the same
摘要 A dummy pad is formed through a polyimide insulating layer so as to be provided opposite to a via connecting pad formed on the surface of a ceramic substrate. A defect occurring in the via connecting pad is filled with a protrusion when the dummy pad is formed. Accordingly, the influence of the defect upon a layer above the dummy pad is prevented. Further, in a method for manufacturing a thin film wiring board obtained by forming a thin film layer on a base substrate having a via that allows interlayer electric conduction, a void defect existing in the via is filled with a conductive material having corrosion resistance against an etchant, and then the thin film layer is formed on the base substrate.
申请公布号 US6465085(B1) 申请公布日期 2002.10.15
申请号 US20000699569 申请日期 2000.10.31
申请人 FUJITSU LIMITED 发明人 SONG ZHIYI;MORIIZUMI KIYOKAZU;SASAHARA TAKAMI;OZAKI NORIKAZU;WATANABE MANABU;UMEMATSU MISAO;KIKUCHI SHUNICHI
分类号 H01L23/538;H05K1/03;H05K3/22;H05K3/24;H05K3/38;H05K3/46;(IPC1-7):B32B3/00 主分类号 H01L23/538
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