发明名称 Method of manufacturing an electro-optical device
摘要 In an active matrix semiconductor display device in which pixel TFTs and driver circuit TFT are formed on the same substrate in an integral manner, the cell gap is controlled by gap retaining members that are disposed between a pixel area and driver circuit areas. This makes it possible to provide a uniform cell thickness profile over the entire semiconductor display device. Further, since conventional grainy spacers are not used, stress is not imposed on the driver circuit TFTs when a TFT substrate and an opposed substrate are bonded together. This prevents the driver circuit TFTs from being damaged.
申请公布号 US6465268(B2) 申请公布日期 2002.10.15
申请号 US20010793116 申请日期 2001.02.27
申请人 发明人
分类号 G02F1/1339;G02F1/1362;H01L21/77;H01L21/84;H01L27/12;(IPC1-7):H01L21/00;G02F1/133 主分类号 G02F1/1339
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