发明名称 Method for preparation of diamond film
摘要 In subjecting a substrate of low electric conductivity to a pretreatment by holding the same within a fluidized bed of diamond particles for the formation of a diamond film on the substrate surface, a treatment method is disclosed which is capable of preventing decrease in the effect of the pretreatment. The pretreatment of the substrate is conducted within a fluidized bed of diamond particles by keeping the electrostatic potential of the substrate in the range from -1.5 to +1.5 kV. It is desirable that the relative humidity of the gas for the fluidization of diamond particles is controlled to be 40% or higher. It is more desirable that ion bombardment onto the substrate surface to effect neutralization of the electrostatic charges. The fluidizing gas is humidified preferably by using a bubbling apparatus or spraying apparatus.
申请公布号 US6465049(B2) 申请公布日期 2002.10.15
申请号 US20000741431 申请日期 2000.12.21
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 NOGUCHI HITOSHI;KUBOTA YOSHIHIRO
分类号 H01L21/027;C23C16/02;C23C16/26;C23C16/27;(IPC1-7):B05D1/22 主分类号 H01L21/027
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