EXPOSURE APPARATUS FOR LIQUID CRYSTAL DISPLAY MANUFACTURING AND EXPOSURE PATTERN ALIGNMENT METHOD THEREOF

摘要

PURPOSE: An exposure apparatus for liquid crystal display manufacturing and an exposure pattern alignment method thereof are provided to detect and compensate misalignment of a large mother board and a mask by securing the stroke length required for transferring the large mother board while preventing transfer accuracy from being lowered, thereby preventing the exposure pattern inferiority caused by the exposure apparatus. CONSTITUTION: An exposure apparatus(300) for liquid crystal display manufacturing includes a base board(301), an optical element(350) formed on the base board for scanning light toward the base board, a pattern mask transfer element(340) passing a pattern mask(341) through the lower part of the optical scanner, at least two or more multi union stroke units(321) combined in series at the base board to have the same direction as the transfer direction of the pattern mask, a transfer unit transferring an exposure target object following the multi union stroke units at the same displacement as the pattern mask.