| 摘要 |
PROBLEM TO BE SOLVED: To provide a charged particle beam aligner in which a Coulomb effect can be reduced without the sacrifice of throughput. SOLUTION: An electron beam 2 emitted from an electron beam source 1 illuminates a shaping aperture 4 uniformly through a first illumination lens 31 and a second illumination lens 32. The electron beam passed through the shaping aperture 4 focuses the image of the shaping aperture 4 on a reticle 6 through a third illumination lens and a fourth illumination lens. The shaping aperture 4 is composed of a BAA and only an electron beam passed through the unit aperture of the BAA illuminates a specified sub-field of view on the reticle 6 through deflectors 51 and 52. The electron beam passed through the reticle 6 focuses the image of the reticle 6 on a wafer 8 through a first projection lens 71 and a second projection lens 72. The reticle image is reduced by a factor of 4 by the projection lenses. In this regard, aberration, Coulomb effect, and the like, are corrected by a deflector, a focus point correction lens, an astigmatism corrector, and the like, not shown in Fig.
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