| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist coating method, a thin-film forming method and a method of manufacturing an electro-optical device, by which a resist film can be reliably formed on a substrate having projections and depressions, without leaving uncoated regions. SOLUTION: This thin-film forming method comprises a step of forming a subject metal film (5) on a substrate (2), a first resist coating step of coating the metal film with a first resist, (7) having viscosity lower than reference viscosity, a second resist coating step of coating the first resist with a second resist (8) having the reference viscosity. and a step of forming a thin film having a prescribed pattern, by using a resist film constituted by the first resist and the second resist, to selectively eliminate the metal film by photolithographic method. Applying the first resist having lower viscosity first prevents occurrence of resist uncoated regions on the substrate which already has projections and depressions. |
