发明名称 PHOTOELECTRIC TRANSDUCING APPARATUS AND ITS FORMING METHOD
摘要 <p>PROBLEM TO BE SOLVED: To overcome the problem that strict management is required in a cleaning process and a manufacturing environment to prevent a case where a reliable oxide film could not be formed since a gap is generated at the junction portion between aluminum foil and a silicon ball, marks and defects are generated in a granular semiconductor, and contamination is mixed. SOLUTION: In the photoelectric conversion apparatus, a number of one- conductivity-type hemispherical semiconductor particles are provided on a substrate having a conductive region on a surface, an insulating region is provided among the semiconductor particles, and an inverse-conductivity-type semiconductor layer is formed from the upper portion of the semiconductor particle to that of the insulating region. In this case, an angle set by the surface of the hemispherical semiconductor particle and the substrate should be 90 deg. or higher.</p>
申请公布号 JP2002299655(A) 申请公布日期 2002.10.11
申请号 JP20010097713 申请日期 2001.03.29
申请人 KYOCERA CORP 发明人 KITAHARA NOBUYUKI;KYODA TAKESHI;SUGAWARA MAKOTO;ARIMUNE HISAO
分类号 H01L31/04;(IPC1-7):H01L31/04 主分类号 H01L31/04
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