| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an electron beam exposing reticle blank manufacturing method which easily forms silicon struts having a uniform strut width in the uniform depth direction, and the preside a mask. SOLUTION: The electron beam exposing reticle blank manufacturing method intended to manufacture an electron beam exposing reticle blank composed of a plurality of membranes and a grid-like silicon strut part 18a supporting them comprises a step of preparing an SOI wafer composed of a silicon thin film layer 16, a silicon oxide layer 17 and a silicon support substrate 18, a step of electrical discharge machining of the support substrate 18 for forming the half-finished grid-like silicon strut part 18a and a step of dry-etching the support substrate with the silicon oxide layer 17 used as an etching stopper to completely finish the grid-like silicon strut part 18a.</p> |
