发明名称 SEMICONDUCTOR SUBSTRATE DEVELOPER
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor substrate developer capable of uniformly developing a plurality of semiconductor substrates at the same time. SOLUTION: A motor 2 spins the plurality of semiconductor substrates mounted in a substrate hold tray 4. A pressure controller 10 controls the pressures of developing liquid and cleaning liquid sprayed for specified times from a developer liquid nozzle 8 and a cleaning liquid nozzle 7 disposed in the upper part of the semiconductor substrate.
申请公布号 JP2002299230(A) 申请公布日期 2002.10.11
申请号 JP20010104877 申请日期 2001.04.03
申请人 FURUKAWA ELECTRIC CO LTD:THE 发明人 KURAHASHI NOBUHIKO;TOYOSAKI KOICHI;HAMAKAWA SATOSHI;IRINO SATOSHI
分类号 G03F7/30;H01L21/027;H01L21/304;(IPC1-7):H01L21/027 主分类号 G03F7/30
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