发明名称 |
SEMICONDUCTOR SUBSTRATE DEVELOPER |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor substrate developer capable of uniformly developing a plurality of semiconductor substrates at the same time. SOLUTION: A motor 2 spins the plurality of semiconductor substrates mounted in a substrate hold tray 4. A pressure controller 10 controls the pressures of developing liquid and cleaning liquid sprayed for specified times from a developer liquid nozzle 8 and a cleaning liquid nozzle 7 disposed in the upper part of the semiconductor substrate. |
申请公布号 |
JP2002299230(A) |
申请公布日期 |
2002.10.11 |
申请号 |
JP20010104877 |
申请日期 |
2001.04.03 |
申请人 |
FURUKAWA ELECTRIC CO LTD:THE |
发明人 |
KURAHASHI NOBUHIKO;TOYOSAKI KOICHI;HAMAKAWA SATOSHI;IRINO SATOSHI |
分类号 |
G03F7/30;H01L21/027;H01L21/304;(IPC1-7):H01L21/027 |
主分类号 |
G03F7/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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