发明名称 DETECTING METHOD AND EXPOSING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a method for detecting the focus position of a projection optical system accurately, and an exposing method employing a projection optical system where the focus position is detected by the detecting method. SOLUTION: At the time of detecting the focus position of the projection optical system projecting a pattern PA, the pattern PA is projected through the projection optical system, an image of the projected pattern PA is picked up at at least two different positions in the direction of the optical axis of the projection optical system, and the focus position of the projection optical system is detected based on the length of the pattern PA thus picked up.
申请公布号 JP2002299216(A) 申请公布日期 2002.10.11
申请号 JP20010103101 申请日期 2001.04.02
申请人 NIKON CORP 发明人 HOBIKI YUTAKA
分类号 G01M11/02;G03F7/20;G03F7/22;G03F9/00;H01L21/027;(IPC1-7):H01L21/027 主分类号 G01M11/02
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