发明名称 |
POLYSILICON THIN FILM SEMICONDUCTOR AND MANUFACTURING METHOD THEREFOR |
摘要 |
<p>PROBLEM TO BE SOLVED: To improve the fluctuation of display pictures due to the dispersion of the characteristic of driving TIFT by controlling the threshold voltage of a thin film transistor in a low temperature process in a picture display device. SOLUTION: In the manufacture of a thin film semiconductor device where a thin film transistor is integrated, a film which is close to an I (intrinsic) layer where impurity is not mixed in a thin film (sheet resistor is not less than 1.0×10<9> ohm/sq.) is used. For crystallizing an active layer, the threshold voltage of the thin film transistor can be adjusted by suppressing impurity contamination to under 1×10<17> /cm<3> .</p> |
申请公布号 |
JP2002299629(A) |
申请公布日期 |
2002.10.11 |
申请号 |
JP20010098656 |
申请日期 |
2001.03.30 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
YAMAMOTO SHINICHI;NISHIO MIKIO;KAWAKITA TETSUO;TSUTSU HIROSHI |
分类号 |
G02F1/1368;G09F9/30;H01L21/20;H01L21/265;H01L21/336;H01L27/32;H01L29/786;H01L51/50;H05B33/14;(IPC1-7):H01L29/786;G02F1/136 |
主分类号 |
G02F1/1368 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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