发明名称 ELECTROPLATING COMPOSITION FOR PLATING MICROPATTERN OR MICROHOLE
摘要 PURPOSE: An electroplating composition for plating micropattern or microhole is provided, which helps micropattern and microhole plated uniformly on PCB. CONSTITUTION: The electroplating composition for plating micropattern or microhole is characterized in that it contains sulfonate compounds with at least one radical for fluorine substitution and the sulfonate compounds are alkane sulfonate represented by formula I, cycloalkane sulfonate represented by formula II and phenol sulfonate represented by formula III or their derivatives. In the formulae, R1, R2, R3, R4, R5, R6 and R7 denote F, H, CpH2p+1 or CpF2p+1, respectively (p is an integer of 1 to 4) wherein at least one among R1 to R5 is F and at least one between R6 and R7 is F; A denotes alkali metal, alkaline earth metal, hydrogen or -NB1B2B3B4, respectively wherein B1, B2, B3 and B4 denote hydrogen, alkyl, aryl or aralkyl; and n is an integer of 0 to 18.
申请公布号 KR20020076796(A) 申请公布日期 2002.10.11
申请号 KR20010016927 申请日期 2001.03.30
申请人 MINUTA TECHNOLOGY 发明人 KIM, YEON SANG;LEE, HONG HUI;SEO, DONG HYEON
分类号 C25D3/02;(IPC1-7):C25D3/02 主分类号 C25D3/02
代理机构 代理人
主权项
地址