发明名称 ALIGNER
摘要 <p>PROBLEM TO BE SOLVED: To provide an aligner being used in a lithography process for a compound semiconductor wafer in which the compound semiconductor wafer is not cracked easily even upon contact with a mask. SOLUTION: The aligner comprises a holder 13 for holding a mask M, and a section 12 for holding a compound semiconductor wafer W. In order to buffer a pressing force being applied to the compound semiconductor wafer W from the mask M upon contact, the compound semiconductor wafer W is held on the wafer holding section 12 through a buffering member, i.e., a rubber sheet 15 as a resilient member.</p>
申请公布号 JP2002299209(A) 申请公布日期 2002.10.11
申请号 JP20010098900 申请日期 2001.03.30
申请人 SHIN ETSU HANDOTAI CO LTD 发明人 IKEDA HITOSHI;SUZUKI KINGO
分类号 G03F7/20;H01L21/027;H01L21/68;H01L21/683;(IPC1-7):H01L21/027 主分类号 G03F7/20
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