ELECTROSTATICALLY ACTUATED MICRO-ELECTRO-MECHANICAL DEVICES AND METHOD OF MANUFACTURE

摘要

A method is provided for fabricating electrodes for an electrostatically actuated MEMS device. The method includes patterning a wafer to define trenches, with each trench having an area selected in accordance with a desired depth; etching the wafer to form the trenches with the etch rate being varied in accordance with the trench area such that the trenches have depths determined by their respective areas (132); depositing a conductive material in the trenches to form the electrodes; and removing portions of the wafer surrounding the electrodes. A method of fabrication an electrostatically actuated MEMS mirror device is provided. The mirror structure includes a mirror and a suspension mechanism for supporting the mirror. An electrostatically actuated MEMS mirror device is formed. The device includes a middle wafer having raised and inclined steering electrodes; a top wafer including a mirror structure; and a handle wafer providing contacts for the electrodes.