发明名称 Optical beam guidance system and method for preventing contamination of optical components contained therein
摘要 A method for reducing the contamination of at least one optical component (2, 3) contained in the beam guidance space (6) and held by a frame (4, 5) defining the beam guidance space and a corresponding optical beam guidance system. The surfaces of the frame bordering on the beam guidance space are at least partially coated with a degassing barrier layer (7) that preferably does not increase reflectivity. The method and system have use, for example, in lithography irradiation systems working with UV light.
申请公布号 US2002145808(A1) 申请公布日期 2002.10.10
申请号 US20020079580 申请日期 2002.02.22
申请人 CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG 发明人 FREITAG ANSGAR;BINGEL ULRICH;DISTL JOSEF;HAMM UWE W.
分类号 H01L21/027;G02B7/02;G02B27/00;G03F7/20;(IPC1-7):B32B15/04;G02B3/00;G02B7/00;G02B9/00;G02B11/00;G02B13/00;G02B15/00;G02B17/00;G02B25/00 主分类号 H01L21/027
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