发明名称 |
Deformation-susceptible substrate holder for low-pressure MOCVD and process for use thereof |
摘要 |
The present invention relates to a method and apparatus for ensuring uniform and reproducible heating of a deformation-tolerant substrate during low-pressure chemical vapor deposition (CVD) of a metal film on a surface of the substrate. The uniform and reproducible heating of the substrate is achieved in the present invention by positioning the substrate on a beveled surface of a chamfered ring which is located above the heating element in a CVD reactor chamber. The space between heating element, chamfered ring and bottom surface of the substrate define a cavity between the substrate and heating element that ensures that the substrate is heated by radiative means rather than direct contact.
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申请公布号 |
US2002146903(A1) |
申请公布日期 |
2002.10.10 |
申请号 |
US20010829648 |
申请日期 |
2001.04.10 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
LOCKE PETER S.;MALHOTRA SANDRA GUY;MCFEELY FENTON READ;SIMON ANDREW HERBERT;YURKAS JOHN JACOB |
分类号 |
C23C16/48;H01L21/00;H01L21/285;(IPC1-7):H01L21/44 |
主分类号 |
C23C16/48 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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