Lactone ring-containing (meth)acrylate and polymer thereof for photoresist composition

摘要

The invention discloses a novel polymerizable (meth)acrylate ester compound having a lactone ring structure represented by the general formula in which R1 is a hydrogen atom or a methyl group. A synthetic route for the preparation of this (meth)acrylate ester compound is described. This monomeric compound can readily be polymerized into a (co)polymer which is useful as a base resinous ingredient in a chemically amplified photoresist composition having advantages in respects of high transparency to short-wavelength ultraviolet light for patterning exposure and excellent resistance against dry etching in addition to the high sensitivity, fine pattern resolution and excellent adhesion to the substrate surface.