发明名称 METHOD FOR PRODUCING A SEMICONDUCTOR COMPONENT COMPRISING A T-SHAPED CONTACT ELECTRODE
摘要 The invention relates to a method for producing a semiconductor component comprising a contact electrode with a T-shaped cross-section, in particular a field effect transistor with a T-gate. According to the invention, a spacer configured on the edge of the material allows a self-adjusting placement of the gate base and gate head.
申请公布号 WO02063671(A3) 申请公布日期 2002.10.10
申请号 WO2002EP00264 申请日期 2002.01.14
申请人 UNITED MONOLITHIC SEMICONDUCTORS GMBH;BEHAMMER, DAG 发明人 BEHAMMER, DAG
分类号 H01L29/423;H01L21/285;H01L21/335;H01L21/338;H01L29/41;H01L29/812 主分类号 H01L29/423
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