发明名称 DOUBLE DUAL SLOT LOAD LOCK FOR PROCESS EQUIPMENT
摘要 Provided herein is a substrate processing system, which comprises a cassette load station; a load lock chamber; a centrally located transfer chamber; and one or more process chambers located about the periphery of the transfer chamber. The load lock chamber comprises double dual slot load locks constructed at same location. such system may be used for processing substrates for semiconductor manufacturing.
申请公布号 WO0223597(A3) 申请公布日期 2002.10.10
申请号 WO2001US28944 申请日期 2001.09.13
申请人 APPLIED MATERIALS, INC. 发明人 KURITA, SHINICHI;BLONIGAN, WENDELL, T.
分类号 H01L21/00;H01L21/02;H01L21/677 主分类号 H01L21/00
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