发明名称 NON-THERMAL PLASMA REACTOR SUBSTRATE DESIGN-E-SHAPE WITH LOW LOSS ELECTRODE PATTERN
摘要 A low-loss electrode-printed structural dielectric barrier (24, 26) for a non-thermal plasma reactor stack and non-thermal plasma multi-cell stacks (40) having low-loss electrodes (18, 20). The low-loss electrode-printed structural dielectric barriers (24, 26) include a structural dielectric barrier (10) having a first side (11) and a second opposite side (22); a low-loss electrode pattern (18, 20) disposed on the second side (22) of the structural dielectric barrier (10); the low-loss electrode pattern (18, 20) comprising first and second major electrode sections (21, 23) that are offset from any ribs (12, 14), supports, ligaments, spacers, tines, or other structure that serves as a structural dielectric connection between dielectric barriers in a multi-cell stack (40), a connector (34) disposed between and electrically connecting the first and second major electrode sections (21, 23) and offset relative to a centerline (39) perpendicular to the rib (12, 14) orientation, and a bus path connector (36, 38) electrically connected to one of the major electrode sections (21, 23) and offset relative to the centerline (39).
申请公布号 WO02078838(A1) 申请公布日期 2002.10.10
申请号 WO2002US09659 申请日期 2002.03.28
申请人 DELPHI TECHNOLOGIES, INC. 发明人 NELSON, DAVID, EMIL;LI, BOB, XIAOBIN;LESSOR, DELBERT, L.
分类号 B01D53/32;B01J19/24;H05H1/24 主分类号 B01D53/32
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