CHIP WITH PROTRUDING MICROELECTRODES AND METHOD FOR THE PRODUCTION THEREOF

摘要

Disclosed is a method for the production of microelectrodes (22) on a chip (10). The inventive method consists of the following: a passivating layer is initially applied to the surface (12) of a substrate (10) with the exception of certain areas (18) thereof. This is followed by selective epitactic crystal growth on said areas (18) of the chip in order to produce protruding microelectrodes (22) which can be doped in such a way as to exhibit sufficient conductivity. The inventive method can be integrated into a CMOS process in order to produce a large number of microscopically small microelectrodes which protrude from the surface of the chip and which can be directly combined with control circuits which are produced on the chip as part of the CMOS process.