SPUTTER DEVICE

摘要

The invention is intended to easily change the shape of a magnetic field when auxiliary poles are to be provided in a sputter device. A sputter device, in which one or more magnetron type sputter evaporation sources (3) and one or more auxiliary poles (9) are disposed in a chamber (1) in such a manner as to surround an evaporation subject (2), comprises an angle changing mechanism for changing the angle of the auxiliary poles (9) with respect to the evaporation subject (2) in order to change the shape of a magnetic field which is formed by cooperation between the magnetron type sputter evaporation sources (3) and the auxiliary poles (9).