发明名称 |
MANUFACTURING DEVICE AND MANUFACTURING METHOD FOR SUBSTRATE FOR LIQUID CRYSTAL DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To form the oriented film of uniform thickness without drying irregularities without unlimitedly prolonging leveling process time. SOLUTION: A substrate to which a polyimide solution is applied is left alone under a solvent atmosphere inside the casing of a leveling vessel 82 and leveled. A leveling state detection part 86 detects the state of the film irregularities of the oriented film by using a two-dimensional CCD. When the leveling state detection part 86 detects that a sufficient leveling state is attained, a process control part 87 outputs a control signal to a carrying mechanism and a palette 84 on which the substrate is mounted is moved to a drying furnace 83. Thus, a drying process is started. The start of the drying process is decided in accordance with the leveling state and the flat oriented film is obtained without unlimitedly prolonging manufacturing time. |
申请公布号 |
JP2002296598(A) |
申请公布日期 |
2002.10.09 |
申请号 |
JP20010097542 |
申请日期 |
2001.03.29 |
申请人 |
SEIKO EPSON CORP |
发明人 |
YAZAKI MASAYUKI;YAMADA KENICHI |
分类号 |
G01B11/06;G02F1/1337;(IPC1-7):G02F1/133 |
主分类号 |
G01B11/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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