发明名称 MANUFACTURING DEVICE AND MANUFACTURING METHOD FOR SUBSTRATE FOR LIQUID CRYSTAL DEVICE
摘要 PROBLEM TO BE SOLVED: To form the oriented film of uniform thickness without drying irregularities without unlimitedly prolonging leveling process time. SOLUTION: A substrate to which a polyimide solution is applied is left alone under a solvent atmosphere inside the casing of a leveling vessel 82 and leveled. A leveling state detection part 86 detects the state of the film irregularities of the oriented film by using a two-dimensional CCD. When the leveling state detection part 86 detects that a sufficient leveling state is attained, a process control part 87 outputs a control signal to a carrying mechanism and a palette 84 on which the substrate is mounted is moved to a drying furnace 83. Thus, a drying process is started. The start of the drying process is decided in accordance with the leveling state and the flat oriented film is obtained without unlimitedly prolonging manufacturing time.
申请公布号 JP2002296598(A) 申请公布日期 2002.10.09
申请号 JP20010097542 申请日期 2001.03.29
申请人 SEIKO EPSON CORP 发明人 YAZAKI MASAYUKI;YAMADA KENICHI
分类号 G01B11/06;G02F1/1337;(IPC1-7):G02F1/133 主分类号 G01B11/06
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