| 摘要 |
PROBLEM TO BE SOLVED: To provide a chemical amplification type positive resist composition containing a resin component and an acid generating agent and suitable for excimer laser lithography with ArF or KrF laser and to provide a composition showing excellent balance in performances of resolution, profile, sensitivity, durability against dry etching, adhesion property or the like. SOLUTION: The chemical amplification type positive resist composition contains a resin which has polymerization units (A), (B), (C) and which is insoluble with alkali but becomes alkali-soluble by the effect of acids, and an acid generating agent. The unit (A) is at least one kind of polymerization unit selected from polymerization units expressed by formulae (Ia) and (Ib). The unit (B) is at least one kind of polymerization unit selected from polymerization unit expressed by formula (II), polymerization units consisting of polymerization units expressed by formula (III) and polymerization units derived from maleic acid anhydride or itaconic acid anhydride, and polymerization units expressed by formula (IV). The unit (C) is a polymerization unit which becomes alkali- soluble by separating a part of group by the effect of acids. |
