| 摘要 |
PROBLEM TO BE SOLVED: To generate ultra-fine particles and stably form a film of the ultra-fine particles on a substrate at high speed. SOLUTION: This method for generating particulate material in an atmosphere of helium gas of an inert gas, by heating and evaporating a raw material with an arc heating method, utilizes a method of evaporation in gas, and is characterized by heating the above raw material through discharge at an arc discharge voltage of 17 V or less. The method for generating particulate material for film formation is further characterized by employing an arc electrode of which the tip consists of several discharge parts, and employing the above method of evaporation in gas for combining each evaporated atom which is generated by evaporation of the raw material in a vacuum chamber by colliding the atoms with the inert gas introduced in the chamber. The film forming method comprises introducing the particulate material for film formation as well as the inert gas through a transfer pipe into a film forming chamber, and forming a thin film on a substrate arranged on a stage in the above film- forming chamber through a nozzle.
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