Method of fabricating deflection aperture array for electron beam exposure apparatus, wet etching method and apparatus for fabricating ther apertture array,,申请号GB19990013426-传众专利搜索

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发明名称	Method of fabricating deflection aperture array for electron beam exposure apparatus, wet etching method and apparatus for fabricating ther apertture array,
摘要
申请公布号	GB2338340(B)	申请公布日期	2002.10.09
申请号	GB19990013426	申请日期	1999.06.09
申请人	* ADVANTEST CORPORATION	发明人	SHIGERU * MARUYAMA
分类号	H01L21/306;H01J9/14;H01J37/04;(IPC1-7):H01J9/14	主分类号	H01L21/306
代理机构		代理人
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地址

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